27 November 1989 Laser Plasma X-Ray Source And Its Application To Lithography
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Abstract
Laser plasma is a unique source of high brightness ( > 1010 W/cm2) and pulsive ( <10-9 sec. ) x rays. X-ray spectrum and intensity can be controlled by carefully choosing various experimental parameters such as laser wavelength, target material, and laser pulse width. These detailed knowledge of laser plasma x rays (LAPLAX) may be used for many applications. X-ray lithography is one such example, which is to achieve less than a few thousand Å spatial resolution. Making use of LAPLAX,we propose a conceptual design of an x-ray lithography system.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. A. Tanaka, K. A. Tanaka, H. Aritome, H. Aritome, T. Kanabe, T. Kanabe, M. Nakatsuka, M. Nakatsuka, T. Yamanaka, T. Yamanaka, S. Nakai, S. Nakai, "Laser Plasma X-Ray Source And Its Application To Lithography", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961844; https://doi.org/10.1117/12.961844
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