27 November 1989 Reflectivity Measurements Of Multilayer X-Ray Mirrors At Normal Incidence
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Abstract
Evaporated and sputtered multilayer mirrors consisting of the layers Ti-Si, Nb-Si, Mo-Si and Ti-Be for the wavelength range λ = 30-35 nm are synthesized on flat and spherical substrates. Preliminary measurements are carried out at sliding incidence for λ = 0.154 nm (CuKa∝ ) and for the range λ = 10-21 nm. To measure the reflectivity under normal incidence for the wavelengths range λ ~30-35 nm an experimental method of studying point X-ray source image is developed. Plasma from the focused laser beam at the surface of sulphur is used as an X-ray source. This source and its image produced by multilayer spherical mirror are studied simultaneously with XUV spectrograph of spatial resolution. The comparison of the spectra of the source, which contains many lines and its image, enables one to find the spectral dependence of mirror reflectivity at nearly normal incidence (for incidence angle up to 0.1° ) . Another facility was used for flat multilayer reflectivity measurement at λ~10 - 21 nm Experimental reflectivities in this range are up to 51 %.
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A. V. Vinogradov, I. V. Kozhevnikov, V. E. Levashov, S. I. Sagitov, V. A, Chirkov, V. V. Kondrateriko, I. F. Mikhailov, A. I. Fedorenko, I. I. Lyakhovskaya, "Reflectivity Measurements Of Multilayer X-Ray Mirrors At Normal Incidence", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961873; https://doi.org/10.1117/12.961873
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