27 November 1989 Stability Of Multilayers For X-Ray Optics Under Pulsed Laser Irradiation And Classical Thermal Treatments
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Abstract
Results concerning thermal stability of W/C, Ni/C, W/Si and W/Ti multilayers under pulsed laser irradiation are deduced from small angle X-Ray diffraction measurements and are compared with effects of thermal annealing under secondary vacuum on samples from the same batch. The microstructure was controlled by transmission electron microscopy in the plane of the layers. Composition profiles were determined by combining simulation of small angle X-Ray scattering patterns and Auger electron spectroscopy. This allowed us to propound different diffusion mechanisms, depending on the nature of the components and on the conditions of elaboration.
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V. Dupuis, M. F. Ravet, M. Piecuch, C. Tete, "Stability Of Multilayers For X-Ray Optics Under Pulsed Laser Irradiation And Classical Thermal Treatments", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); doi: 10.1117/12.961880; https://doi.org/10.1117/12.961880
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