Phase controlled interference lithography: a dynamic tool for large-area fabrication of nano-photonic structures

Swagato Sarkar; Joby Joseph

doi:10.1117/12.2559673

20 May 2020 Phase controlled interference lithography: a dynamic tool for large-area fabrication of nano-photonic structures

Swagato Sarkar, Joby Joseph

Author Affiliations +

Proceedings Volume 11402, Three-Dimensional Imaging, Visualization, and Display 2020; 114020B (2020) https://doi.org/10.1117/12.2559673
Event: SPIE Defense + Commercial Sensing, 2020, Online Only

Abstract

The field of nanophotonics is a fascinating branch of optics that has shown a whole new-perspective of light-matter interaction, or more specifically the controlling or ‘molding the flow’ of light. Periodic nanostructures in one, two, and three dimensions have been the active block of such light-manipulation, resulting in numerous applications and finally emerging as one of the interesting fields of the science community in the last decade. Such applications range from filtering, optical guiding, field enhancing, confinement/light-trapping optical computing, signal processing towards a whole set of parametric sensing that can affect the resonance mechanism associated with these nanophotonic structures. Although there are a series of fabrication approaches, the present review article covers the state of the art in ‘phase-controlled interferencelithography’ based fabrication technique for different application-oriented possibilities, utilizing the benefits of scalability and reconfigurability.

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Citation Download Citation

Swagato Sarkar and Joby Joseph "Phase controlled interference lithography: a dynamic tool for large-area fabrication of nano-photonic structures", Proc. SPIE 11402, Three-Dimensional Imaging, Visualization, and Display 2020, 114020B (20 May 2020); https://doi.org/10.1117/12.2559673

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