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1.3 µm Flat-surface Buried Heterostructure (FBH) laser diode fabricated on a p-type substrate is reported. This laser exhibits a low threshold current and excellent lasing characteristics up to 120°C. For high temperature range operation, it is found that the active layer thickness plays an important role. Stable CW operation has been confirmed in 85°C 5 mW aging test.
I. Ushijima,S. Osaka,A. Fukushima,T. Ohizumi,S. Nakai,K. Kihara,S. Isozumi, andT. Shibata
"1.3 µm InGaAsP/InP Flat-Surface Buried Heterostructure Laser Diode Fabricated On P-Type Substrate", Proc. SPIE 1144, 1st Intl Conf on Indium Phosphide and Related Materials for Advanced Electronic and Optical Devices, (28 November 1989); https://doi.org/10.1117/12.962028
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I. Ushijima, S. Osaka, A. Fukushima, T. Ohizumi, S. Nakai, K. Kihara, S. Isozumi, T. Shibata, "1.3 µm InGaAsP/InP Flat-Surface Buried Heterostructure Laser Diode Fabricated On P-Type Substrate," Proc. SPIE 1144, 1st Intl Conf on Indium Phosphide and Related Materials for Advanced Electronic and Optical Devices, (28 November 1989); https://doi.org/10.1117/12.962028