Combining UV-and electron-beam lithography for superconducting bandpass filters in mm/sub-mm astronomy

David Thoen; Vignesh Murugesan; Kenichi Karatsu; Alejandro Pascual Laguna; Akira Endo; Jochem J. A. Baselmans

doi:10.1117/12.2561452

13 December 2020 Combining UV-and electron-beam lithography for superconducting bandpass filters in mm/sub-mm astronomy

David Thoen, Vignesh Murugesan, Kenichi Karatsu, Alejandro Pascual Laguna, Akira Endo, Jochem J. A. Baselmans

Proceedings Volume 11453, Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy X; 114532Q (2020) https://doi.org/10.1117/12.2561452
Event: SPIE Astronomical Telescopes + Instrumentation, 2020, Online Only

Conference Poster

Abstract

Microfabrication of on-chip filterbanks, such as DESHIMA 2.0, would greatly benefit from reliable fabrication with sub-micrometer resolution. This enables smaller devices and reduces scatter in parameters such as filter bandwidth and resonant frequency. Here we present “mix-and-match” processing by combining optical and electron-beam exposures of a single layer of negative ma-N1405 resist from Micro-Resist-Technology GmbH. This allows for minimal features down to 300 nm where needed and large structure exposure with UV, limiting e-beam writing time. Relative alignment is possible to less than 500 nm on a regular basis.

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David Thoen, Vignesh Murugesan, Kenichi Karatsu, Alejandro Pascual Laguna, Akira Endo, and Jochem J. A. Baselmans "Combining UV-and electron-beam lithography for superconducting bandpass filters in mm/sub-mm astronomy", Proc. SPIE 11453, Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy X, 114532Q (13 December 2020); https://doi.org/10.1117/12.2561452

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