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15 January 1989 Preparation And Characterization Of Thin Films Of Amorphic Diamond
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Abstract
Reported here is the use of a unique laser plasma source able to deposit thin films of amorphic diamond at practical rates of growth. The beam from a pulsed Nd-YAG Laser is focused at very high power densities of 1012 W/cm2 onto graphite feedstock in an ultrahigh vacuum environment. The resulting plasma ejects carbon ions able to migrate to the plane of deposition. In this way diamond-like coatings have been applied to silicon, gold, germanium, glass, and plastic. No seeding or heating of the substrate is needed and substrate temperatures seem to remain at ambient room values during processing. Progress in the characterization of this material will be reported.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. B. Collins, F. Davanloo, E. M. Juengerman, D. R Jander, and T. J. Lee "Preparation And Characterization Of Thin Films Of Amorphic Diamond", Proc. SPIE 1146, Diamond Optics II, (15 January 1989); https://doi.org/10.1117/12.962060
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