Preparation And Characterization Of Thin Films Of Amorphic Diamond

C. B. Collins; F. Davanloo; E. M. Juengerman; D. R Jander; T. J. Lee

doi:10.1117/12.962060

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15 January 1989 Preparation And Characterization Of Thin Films Of Amorphic Diamond

C. B. Collins, F. Davanloo, E. M. Juengerman, D. R Jander, T. J. Lee

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Proceedings Volume 1146, Diamond Optics II; (1989) https://doi.org/10.1117/12.962060
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Reported here is the use of a unique laser plasma source able to deposit thin films of amorphic diamond at practical rates of growth. The beam from a pulsed Nd-YAG Laser is focused at very high power densities of 10¹² W/cm² onto graphite feedstock in an ultrahigh vacuum environment. The resulting plasma ejects carbon ions able to migrate to the plane of deposition. In this way diamond-like coatings have been applied to silicon, gold, germanium, glass, and plastic. No seeding or heating of the substrate is needed and substrate temperatures seem to remain at ambient room values during processing. Progress in the characterization of this material will be reported.

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C. B. Collins, F. Davanloo, E. M. Juengerman, D. R Jander, and T. J. Lee "Preparation And Characterization Of Thin Films Of Amorphic Diamond", Proc. SPIE 1146, Diamond Optics II, (15 January 1989); https://doi.org/10.1117/12.962060

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