15 January 1989 Properties Of Low Temperature Plasma CVD Diamond Films
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Abstract
In the microwave plasma deposition (PECVD) of diamond from methane, the variables available for controlling the microstructure of the resulting films are the plasma composition and density, the substrate surface properties, and the temperature. It has been demonstrated that the competition between nucleation site formation and the rate of reactive plasma etching is the critical feature in the development of the film microstructure. Through reducing the deposition temperature and enhancing the etching rates of sp2 carbon, fine grained optical quality diamond films have been produced.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan B. Harker, "Properties Of Low Temperature Plasma CVD Diamond Films", Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962072; https://doi.org/10.1117/12.962072
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