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15 January 1989 Pulsed Laser Deposition Of Amorphous Carbon Films
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We have deposited thin amorphous carbon films on various substrate materials by irradiating a high purity (5N) graphite target in vacuum with pulsed light at 248 nm from a KrF excimer laser. The films have been characterized by Raman scattering, AES, SEM and chemical inertness tests. The films deposited on silicon are smooth and partially transparent. The preliminary Raman spectra show no evidence of crystalline grains (diamond or graphite) however the films deposited on silicon and quartz survived etching by a solution of HF:HNO3 (1:1). We will report on the substrate temperature dependence of laser deposited films and the variation of film quality on substrate material.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. T. Demers and D. G. Harris "Pulsed Laser Deposition Of Amorphous Carbon Films", Proc. SPIE 1146, Diamond Optics II, (15 January 1989);

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