12 December 1989 Titanium Nitride Antireflection Coating For Textured Polysilicon Solar Cells
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Suitability of sputter deposited titanium nitride as an antireflection coating on large area, textured polycrystalline silicon solar cells is examined. The TiN films deposited on solar cells are characterised for their thickness and refractive index using a Gaertner Ellipsometer. Measurements on solar cell out-put characteristics show an enhancement in the short-circuit current in the range of 12 - 25%. It is observed that even for an optimised TiN coating thickness, the number of reflecting grains on the textured surface of the polycrystalline silicon solar cells determine the current enhancement. Spectral response measurements indicate that apart from providing very good optical coupling, TiN film also effectively passivates the solar cell surface.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Tiku, P. Tiku, V. Ramamurthy, V. Ramamurthy, } "Titanium Nitride Antireflection Coating For Textured Polysilicon Solar Cells", Proc. SPIE 1149, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VIII, (12 December 1989); doi: 10.1117/12.962182; https://doi.org/10.1117/12.962182

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