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22 August 2020 Development of x-ray mirrors for XFEL sub-10 nm focusing system based on Wolter type III geometry
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Abstract
Focusing x-ray free-electron lasers (XFEL) allows us to study nonlinear optics within the xray region. Recently, we challenged the focusing XFELs to below 10 nm. However, the conventional multilayer Kirkpatrick-Baez(KB) mirrors require too strict alignment accuracy of the incident angle. To solve this problem, we propose advanced KB (AKB) mirrors, based on Wolter type III geometry. Because the configuration satisfies the Abbe sine condition, AKB mirrors enables a tolerance of incident angle error 1000 times greater than conventional KB mirrors. The remaining problem is how such mirrors are to be fabricated, because required shape accuracy is below 1 nm and the small radius of curvature on the mirrors makes high accuracy shape measurement difficult. In this work, we performed a mirror fabrication procedure based on a combination of a grating interferometer and a differential deposition. Experiment at BL29XUL of SPring-8 demonstrated AKB mirrors with an accuracy of λ/4 fabricated.
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© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takato Inoue, Jumpei Yamada, Satoshi Matsuyama, Nami Nakamura, Taito Osaka, Hirokatsu Yumoto, Takahisa Koyama, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Development of x-ray mirrors for XFEL sub-10 nm focusing system based on Wolter type III geometry", Proc. SPIE 11491, Advances in X-Ray/EUV Optics and Components XV, 114910B (22 August 2020); https://doi.org/10.1117/12.2566856
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