PROCEEDINGS VOLUME 11492
SPIE OPTICAL ENGINEERING + APPLICATIONS | 24 AUGUST - 4 SEPTEMBER 2020
Advances in Metrology for X-Ray and EUV Optics IX
Editor Affiliations +
Proceedings Volume 11492 is from: Logo
SPIE OPTICAL ENGINEERING + APPLICATIONS
24 August - 4 September 2020
Online Only, California, United States
Front Matter: Volume 11492
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149201 (2020) https://doi.org/10.1117/12.2581593
Slope Profilometry and Interferometry
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149203 (2020) https://doi.org/10.1117/12.2570412
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149204 (2020) https://doi.org/10.1117/12.2569751
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149205 (2020) https://doi.org/10.1117/12.2570462
Kota Hashimoto, Takeshi Ashizawa, Mikiya Ikuchi, Katsuyoshi Endo
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149206 (2020) https://doi.org/10.1117/12.2567841
Sub-nanometer and Nanoradian-angle Metrology Instrumentation, Methods, and Calibration
Artur C. Pinto, Bernd C. Meyer, Sergio A. L. Luiz, Yuri R. Tonin, Regis S. de Oliveira, Flavio A. Borges, Lucas M. Volpe, Gabriel V. Claudiano, Renan R. Geraldes
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 1149209 (2020) https://doi.org/10.1117/12.2568868
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920A https://doi.org/10.1117/12.2570370
Sub-aperture Stitching
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920B https://doi.org/10.1117/12.2567561
Qiaoyu Wu, Qiushi Huang, Yingna Shi, Xudong Xu, Runze Qi, Zhong Zhang, Yumei He, Jie Wang, Zhanshan Wang
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920C (2020) https://doi.org/10.1117/12.2567385
Metrology of Variable Line Spacing Diffraction Gratings
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920D (2020) https://doi.org/10.1117/12.2568705
Metrology of Adaptive and Wavefront-preserving Optics
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920G https://doi.org/10.1117/12.2570538
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920H (2020) https://doi.org/10.1117/12.2570604
Hirokatsu Yumoto, Haruhiko Ohashi, Hiroshi Yamazaki, Yasunori Senba, Takahisa Koyama, Kenji Tamasaku, Ichiro Inoue, Taito Osaka, Jumpei Yamada, et al.
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920I (2020) https://doi.org/10.1117/12.2570154
Yasunori Senba, Hirokatsu Yumoto, Takahisa Koyama, Takanori Miura, Hikaru Kishimoto, Yasuhiro Shimizu, Hiroshi Yamazaki, Haruhiko Ohashi
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920J https://doi.org/10.1117/12.2570168
X-ray Interferometry, Wavefront Sensing Techniques, and Characterization I
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920L (2020) https://doi.org/10.1117/12.2568499
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920M https://doi.org/10.1117/12.2568929
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920N (2020) https://doi.org/10.1117/12.2570007
X-ray Interferometry, Wavefront Sensing Techniques, and Characterization II
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920O (2020) https://doi.org/10.1117/12.2569135
Takenori Shimamura, Yoko Takeo, Takashi Kimura, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, Hidekazu Mimura
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920P (2020) https://doi.org/10.1117/12.2569845
Shuai Zhao, Ke-yi Wang, Guang-yu Cheng, Yuan Shen, Yu-shan Wang, Lei Zhang
Proceedings Volume Advances in Metrology for X-Ray and EUV Optics IX, 114920Q (2020) https://doi.org/10.1117/12.2576152
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