Reflective optics for EUV/x-ray sources at Thales SESO: possibilities and perspectives

Luca Peverini; H. Guadalupi; T. Michel; S. Perrin; R. Neviere; Christian du Jeu

doi:10.1117/12.2570604

26 August 2020 Reflective optics for EUV/x-ray sources at Thales SESO: possibilities and perspectives

Luca Peverini, H. Guadalupi, T. Michel, S. Perrin, R. Neviere, Christian du Jeu

Proceedings Volume 11492, Advances in Metrology for X-Ray and EUV Optics IX; 114920H (2020) https://doi.org/10.1117/12.2570604
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Abstract

Over more than 50th years Thales SESO represent a world leading designer and manufacturer of high-end, optical components such as telescopes and satellite-based space observation optics operating over the entire spectral range from infrared to x-ray wavelengths. Since early 90th we are actively working in the EUV, Soft-X-ray and hard X-ray spectral range, by developing new equipment and introducing metrology innovations and brand new patented products such as bender and bimorphs mirrors (1st and 2nd generation). In particular a set of customized solution and integrated system for imaging and spectroscopy have been developed basing on the original Wolter and Kirckpatrick-Baez design. Few example of reflective optics behaving both, as collimator, focusing and imaging device are discussed in this paper. A set of solutions to realize fixed curvature optics and dynamically bended device will be detailed to illustrate the flexibility and performances of these products..

Citation Download Citation

Luca Peverini, H. Guadalupi, T. Michel, S. Perrin, R. Neviere, and Christian du Jeu "Reflective optics for EUV/x-ray sources at Thales SESO: possibilities and perspectives", Proc. SPIE 11492, Advances in Metrology for X-Ray and EUV Optics IX, 114920H (26 August 2020); https://doi.org/10.1117/12.2570604

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KEYWORDS

Reflectivity

Imaging spectroscopy

Imaging systems

Metrology

Mirrors

Extreme ultraviolet

Hard x-rays

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