Refinement strategies for optimal inclusion of prior information in ptychography

Paolo Ansuinelli; Wim M.J.M. Coene; H. P. Urbach

doi:10.1117/12.2572019

20 September 2020 Refinement strategies for optimal inclusion of prior information in ptychography

Paolo Ansuinelli, Wim M.J.M. Coene, H. P. Urbach

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 1151711 (2020) https://doi.org/10.1117/12.2572019
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

The imaging and inspection of extreme ultraviolet (EUV) masks is an important aspect of EUV lithography. The availability of actinic mask inspection tools able to generate highly resolved defect maps of defective EUV layouts is needed to ensure defect–free wafer prints. The technological interest towards phase–shift absorber materials for the next generation of EUV masks, and the associated need for phase metrology at the absorber level, makes phase retrieval methods a particularly interesting option for actinic inspection. In this work we use ptychography as an inspection tool for EUV masks. We show how variational and statistical methods can be employed to include a–priori information in the ptychographic inverse problem and how to cluster different update rules – stemming from the minimization of appropriate cost functionals – to optimally include prior information in ptychography under Poisson noise.

Conference Presentation

Citation Download Citation

Paolo Ansuinelli, Wim M.J.M. Coene, and H. P. Urbach "Refinement strategies for optimal inclusion of prior information in ptychography", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 1151711 (20 September 2020); https://doi.org/10.1117/12.2572019

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