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15 June 2020 Optical and stress properties of flexible Nb2O5/SiO2 multi layer films deposited by E-gun evaporation with ion-beam assisted deposition
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Proceedings Volume 11523, Optical Technology and Measurement for Industrial Applications 2020; 1152307 (2020) https://doi.org/10.1117/12.2574756
Event: SPIE Technologies and Applications of Structured Light, 2020, Yokohama, Japan
Abstract
The high & low refractive index (Nb2O5/SiO2)2 multi-layer films were deposited by E-gun evaporation with ion-beam assisted deposition (IAD) on flexible PET substrate. The optical property and anisotropic residual stress were investigated. The residual stress of each layer film was measured step by step with self-made shadow moiré interferometer. The experimental results showed the optimal oxygen flow of Nb2O5 and SiO2 were 20 and 25 sccm, respectively, for the absorption coefficient less than 10-3. The principle stresses were changed from tensor to compressor stress from 6,665 to - 916MPa for one layer to (HL)2 four layers. The shearing stresses were all tensor stresses from 5,876 to 406 MPa for one layer to (HL)2 four layers. The multi-layer films real reduced the residual stress.
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Sheng-Bin Chen, Hsi-Chao Chen, Chun-Hao Chang, Yu-Ru Lu, and Wei-Lin Chen "Optical and stress properties of flexible Nb2O5/SiO2 multi layer films deposited by E-gun evaporation with ion-beam assisted deposition", Proc. SPIE 11523, Optical Technology and Measurement for Industrial Applications 2020, 1152307 (15 June 2020); https://doi.org/10.1117/12.2574756
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