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10 October 2020 Measurement of the threshold ion number in the formation of an ultracold plasma
Syed Zaheer Ud Din, Yufan Li, Dongmei Zhao, Xinwen Ma, Jei Yang
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Proceedings Volume 11545, Semiconductor Lasers and Applications X; 1154504 (2020) https://doi.org/10.1117/12.2572798
Event: SPIE/COS Photonics Asia, 2020, Online Only
Abstract
We present threshold ion number measurement in the formation of an ultracold plasma in a rubidium magneto-optical trap using the photoionization of laser-cooled atoms technique. The density and temperature of the trapped atoms in the magneto-optical trap were about 1010 cm-3 and 500 μK, respectively. The measured value of the lifetime of the ultracold plasma was exactly matched with the calculated value. The threshold ion number in the formation of ultracold plasma was obtained from the linear relationship between ion and electron numbers for different laser energies. The dependence of the threshold ion number on the depth of the potential well was investigated experimentally. The experimental results were explained by the Coulomb potential well model.
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Syed Zaheer Ud Din, Yufan Li, Dongmei Zhao, Xinwen Ma, and Jei Yang "Measurement of the threshold ion number in the formation of an ultracold plasma", Proc. SPIE 11545, Semiconductor Lasers and Applications X, 1154504 (10 October 2020); https://doi.org/10.1117/12.2572798
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KEYWORDS
Ions
Plasma
Chemical species
Laser damage threshold
Magneto-optics
Laser energy
Rubidium
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