High-precision manufacturing technology of continuous phase plate based on magnetorheological finishing

Chen Hu; Jianda Shao; Chaoyang Wei; Haojin Gu

doi:10.1117/12.2573845

10 October 2020 High-precision manufacturing technology of continuous phase plate based on magnetorheological finishing

Chen Hu, Jianda Shao, Chaoyang Wei, Haojin Gu

Proceedings Volume 11548, Optical Design and Testing X; 115481M (2020) https://doi.org/10.1117/12.2573845
Event: SPIE/COS Photonics Asia, 2020, Online Only

Conference Poster

Abstract

Continuous phase plate (CPP) has been widely used in high energy laser optical systems such as inertial confinement fusion (ICF) due to its high energy efficiency and easy control of focal spot shape. At present, Magnetorheological Finishing (MRF) technology is one of the main means to realize CPP high precision processing. This paper analyzes and optimizes the error factors that affect the accuracy improvement in CPP machining process, such as tool path, removal function characteristics, positioning accuracy and material removal amount. The main error source surface shape matching error is analyzed and the frequency domain cross-correlation matching algorithm based on Fourier transform is used to realize the sub-pixel level height between the actual wavefront and the theoretical design wavefront accurate registration. Based on the results of process optimization, the high-precision processing of CPP with the design feature size of 10 mm, the peak to valley (PV) of 1 λ (λ = 1053nm) and gradient rms of 0.82 λ/cm was processed with MRF technology. Through the iteration of two processing stages, the matching accuracy between the processing wavefront and the theoretical wavefront is controlled at 10.5nm (root mean square, RMS), which lays the foundation for CCP processing with larger diameter and smaller cycle.

Citation Download Citation

Chen Hu, Jianda Shao, Chaoyang Wei, and Haojin Gu "High-precision manufacturing technology of continuous phase plate based on magnetorheological finishing", Proc. SPIE 11548, Optical Design and Testing X, 115481M (10 October 2020); https://doi.org/10.1117/12.2573845

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