Design And Preparation Of Polarizers Used In High Power Laser Systems

Peifu Gu; Jingfa Tang

doi:10.1117/12.962557

28 December 1989 Design And Preparation Of Polarizers Used In High Power Laser Systems

Peifu Gu, Jingfa Tang

Proceedings Volume 1158, Ultraviolet Technology III; (1989) https://doi.org/10.1117/12.962557
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

The design and preparation of polarizers used in high power laser systems at operating wavelength of 1060 nm are presented. Ta205 TiO2 composite films and Si02 are used in the manufacture of the polarizers, which are deposited on substrates with index of 1. 514. A Kaufman type ion source has beenapplied with ion energy ranging from 200 eV to 400 eV and current density up to 60 /4A/cm2 dur-ing deposition. The laser damage threshold and optical stability of the polarizers have been improved. The transmittance of the polarizers for p-polarized radiation is greater than 97% and for s-polarized radiation 0. 1 O. 5% hence extinction ratio is about 200-1000.

Citation Download Citation

Peifu Gu and Jingfa Tang "Design And Preparation Of Polarizers Used In High Power Laser Systems", Proc. SPIE 1158, Ultraviolet Technology III, (28 December 1989); https://doi.org/10.1117/12.962557

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