28 July 1989 Fabrication And Test Of Soft X-Ray Multilayer Diffraction Gratings
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Proceedings Volume 1160, X-Ray/EUV Optics for Astronomy and Microscopy; (1989); doi: 10.1117/12.962652
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States
Abstract
Holographic lithography was used to produce a 0.36 μm spatial period grating on top of a Mo/C layered synthetic microstructure. The pattern was transferred to the multilayer mirror by reactive ion etching. The performance of the device has been evaluated at the Cu.Lα,β3 wavelength ( 1.33 nm ). A simple theoretical model explains the main features of the diffraction efficiency of the soft X-ray highly dispersive multilayer mirror.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Berrouane, J. Khan M. Andre, C. Malek, S. Fouchet, F. R. Ladan, R. Rivoira, R. Barchewitz, "Fabrication And Test Of Soft X-Ray Multilayer Diffraction Gratings", Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962652; https://doi.org/10.1117/12.962652
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KEYWORDS
Diffraction gratings

Diffraction

Mirrors

Sensors

Reflectivity

X-rays

Optical components

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