XUV Optical Characterization Of Thin Film And Multilayer Reflectors

D. L. Windt; J. B. Kortright

doi:10.1117/12.962648

28 July 1989 XUV Optical Characterization Of Thin Film And Multilayer Reflectors

D. L. Windt, J. B. Kortright

Proceedings Volume 1160, X-Ray/EUV Optics for Astronomy and Microscopy; (1989) https://doi.org/10.1117/12.962648
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

The measured XUV reflectance versus incidence angle is presented for several multilayer reflectors having various periods, fabricated from W/C, Mo/Si, and Cr₃ C₂ /C. These measurements are compared with calculations using recently derived optical constants, which are also presented. We find that the agreement between the measured and calculated reflectance is best for non-zero values of the interface roughness parameter.

Citation Download Citation

D. L. Windt and J. B. Kortright "XUV Optical Characterization Of Thin Film And Multilayer Reflectors", Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); https://doi.org/10.1117/12.962648

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