28 July 1989 XUV Optical Characterization Of Thin Film And Multilayer Reflectors
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Abstract
The measured XUV reflectance versus incidence angle is presented for several multilayer reflectors having various periods, fabricated from W/C, Mo/Si, and Cr3 C2 /C. These measurements are compared with calculations using recently derived optical constants, which are also presented. We find that the agreement between the measured and calculated reflectance is best for non-zero values of the interface roughness parameter.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. L. Windt, D. L. Windt, J. B. Kortright, J. B. Kortright, } "XUV Optical Characterization Of Thin Film And Multilayer Reflectors", Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962648; https://doi.org/10.1117/12.962648
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