Nanopositioning and -fabrication using the Nano Fabrication Machine with a positioning range up to Ø 100 mm

Jaqueline Stauffenberg; Christoph Reuter; Ingo Ortlepp; Mathias Holz; Denis Dontsov; Christoph Schäffel; Jens-Peter Zöllner; Ivo Rangelow; Steffen Strehle; Eberhard Manske

doi:10.1117/12.2583703

22 February 2021 Nanopositioning and fabrication using the Nano Fabrication Machine with a positioning range up to ⊘100 mm

Jaqueline Stauffenberg, Christoph Reuter, Ingo Ortlepp, Mathias Holz, Denis Dontsov, Christoph Schäffel, Jens-Peter Zöllner, Ivo Rangelow, Steffen Strehle, Eberhard Manske

Author Affiliations +

Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161016 (2021) https://doi.org/10.1117/12.2583703
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

This paper focuses on a new Nano Fabrication Machine 100 (NFM-100) with a working range up to 100 mm in diameter and its integrated tip-based system, which can be used as an Atomic Force Microscope (AFM) as well as for Field-Emission-Scanning-Probe-Lithography (FESPL). The combination of both systems offers the possibility to fabricate and analyze micro- and nanostructures with high resolution and precision down to a single nanometer over a large area in one single configuration without tool or sensor change. After the description of the basic machine structure of the NFM-100, the demonstration of long range and large area AFM scans in combination with the NFM-100 will be shown. Additionally, the basic functionality of the FESPL manufacturing process is presented.

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Jaqueline Stauffenberg, Christoph Reuter, Ingo Ortlepp, Mathias Holz, Denis Dontsov, Christoph Schäffel, Jens-Peter Zöllner, Ivo Rangelow, Steffen Strehle, and Eberhard Manske "Nanopositioning and fabrication using the Nano Fabrication Machine with a positioning range up to ⊘100 mm", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161016 (22 February 2021); https://doi.org/10.1117/12.2583703

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