Post-Moore: prospects for novel patterning of low volume ICs

Michael Fritze

doi:10.1117/12.2593229

24 February 2021 Post-Moore: prospects for novel patterning of low volume ICs

Michael Fritze

Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161004 (2021) https://doi.org/10.1117/12.2593229
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

The end of Moore’s law scaling represents a major paradigm change for the semiconductor industry. Value-add will no longer defined simply by technology but by custom design and architecture solutions for specific applications. This represents a shift in business model to a larger number of more custom designs fabricated in lower volumes. This shift will be discussed together with potential new applications for such low volume chips.

Conference Presentation

Citation Download Citation

Michael Fritze "Post-Moore: prospects for novel patterning of low volume ICs", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161004 (24 February 2021); https://doi.org/10.1117/12.2593229

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