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22 February 2021 Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Fabian Holzmeier, Kevin Dorney, Esben W. Larsen, Thomas Nuytten, Dhirendra P. Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth L. Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen
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Abstract
Imec’s AttoLab is the first industrial laboratory capable of watching the ultrafast dynamics of photoresists following 13.5 nm, EUV exposure, and for emulating high-numerical-aperture (high-NA) exposure on 300-mm wafers using two-beam EUV interference. The two respective beamlines are powered by a laser-based high-harmonic generation EUV source. Its capabilities have recently been proven by imaging 20 nm pitch lines and spaces using Lloyd’s Mirror interference lithography. In parallel, time-averaged and time-resolved techniques for studying the ultrafast dynamics of photoresists after EUV exposure, coherent diffractive imaging to study resist interfaces, and more sophisticated interference lithography techniques for printing sub-22 nm pitches on full 300-mm wafers are being developed. Taking advantage of the bright and short EUV pulses now available at imec, we will be able to contribute to a smooth transition towards next generation high-NA lithography.
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© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fabian Holzmeier, Kevin Dorney, Esben W. Larsen, Thomas Nuytten, Dhirendra P. Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth L. Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, and John Petersen "Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161010 (22 February 2021); https://doi.org/10.1117/12.2595038
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