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22 February 2021 Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology
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Abstract
2D curvilinear patterns are more and more present in the lithography landscape. For the related devices, the line edge roughness (LER) is, as well as for lines and spaces, a critical figure of merit. In this article we propose to use a dedicated edge detection algorithm to measure LER of 2D curvilinear patterns on CD-SEM images. We present an original method to validate the algorithm, in the context of roughness measurement. It is based on the generation of realistic synthetic CD-SEM images with programmed roughness and a precise PSD analysis flow. We show excellent correlation (average R2 = 0.988) between the input roughness parameters and the measured parameters for both 1D and 2D synthetic images. Using synthetic images for different number of frames, the contour extraction sensitivity to noise is also explored. Finally, the methodology is successfully applied to experimental CD-SEM images for two classes of applications : photonic devices and DSA fingerprint patterns.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jonathan Pradelles, Loïc Perraud, Aurélien Fay, Elie Sezestre, Jean-Baptiste Henry, Jessy Bustos, Estelle Guyez, Sébastien Berard-Bergery, Aurélie Le Pennec, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Millequant, Thiago Figueiro, and Patrick Schiavone "Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161110 (22 February 2021); https://doi.org/10.1117/12.2583843
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