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22 February 2021 Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet
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Abstract
The authors present latent image characterization in photoresists by means of extreme ultraviolet (EUV) spectroscopic reflectometry. The optical constants of photoresists before and after exposure are measured in the EUV spectral range. Latent images are investigated in the form of periodic line gratings. The investigation is performed by the analysis of spectroscopic reflectance curves in the wavelength range from 5 nm to 20 nm at grazing incidence angles. Through an analysis of the reflectance curves based on rigorous electromagnetic modeling, a characterization of parameters of interest of the latent image is evaluated. This includes the latent image profile, surface topography and stochastic-related parameters such as line edge roughness.
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© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Serhiy Danylyuk, Sascha Brose, Jochen Stollenwerk, and Peter Loosen "Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116111M (22 February 2021); https://doi.org/10.1117/12.2583830
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