Presentation + Paper
22 February 2021 Recent advancements in atomic force microscopy
M. van Reijzen, M. Boerema, A. Kalinin, H. Sadeghian, C. Bozdog
Author Affiliations +
Abstract
Atomic Force Microscopy (AFM) topographic imaging has enabled semiconductor manufacturing research and development since early '90s. Unique strength over competing metrology techniques includes the potential for undistorted, local high resolution information. Comparatively slow throughput has traditionally limited high volume manufacturing (HVM) deployment. Here, we discuss the advantages of a multi-head AFM system with miniaturized high-speed SPMs working in parallel. In addition, we extend traditional AFM techniques to selective imaging and metrology of subsurface 3D structures and show a path to enabling Overlay metrology through opaque hard mask layers.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. van Reijzen, M. Boerema, A. Kalinin, H. Sadeghian, and C. Bozdog "Recent advancements in atomic force microscopy", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116112E (22 February 2021); https://doi.org/10.1117/12.2595426
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