Qualification of small alignment mark by on-product overlay performance

Jigang Ma; Frans Bijnen; Edo Hulsebos; Lukasz Macht; Sotirios Tsiachris; Jin Dai; Rob van der Meulen; Miao Yu; Paul Böcker; Jung-Hwan Kim; Hyun Kim; Gwang-Gon Kim; Joon-Seuk Lee; Eung-Ryong Oh; Hong-Bok Yeon; Young-Deuk Kim; Seung-Uk Jeong; Sang-Ho Lee; Chan-Ha Park

doi:10.1117/12.2584618

22 February 2021 Qualification of small alignment mark by on-product overlay performance

Jigang Ma, Frans Bijnen, Edo Hulsebos, Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob van der Meulen, Miao Yu, Paul Böcker, Jung-Hwan Kim, Hyun Kim, Gwang-Gon Kim, Joon-Seuk Lee, Eung-Ryong Oh, Hong-Bok Yeon, Young-Deuk Kim, Seung-Uk Jeong, Sang-Ho Lee, Chan-Ha Park

Author Affiliations +

Proceedings Volume 11613, Optical Microlithography XXXIV; 116130J (2021) https://doi.org/10.1117/12.2584618
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In world-leading semiconductor manufacturing, the device feature size keeps on reducing and with it processes become more challenging in the next technology node. The On Product Overlay (OPO) budget is therefore required to reduce further. Alignment is one of the key factors in reducing overlay wafer to wafer (W2W) variations. To save product area and reduce scribe line width, small alignment mark is evaluated to achieve the similar results as reference mark and to optimize the OPO performance. In this work, we will show the experimental results of small alignment mark and investigate the on product overlay performance by simulation.

Conference Presentation

Citation Download Citation

Jigang Ma, Frans Bijnen, Edo Hulsebos, Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob van der Meulen, Miao Yu, Paul Böcker, Jung-Hwan Kim, Hyun Kim, Gwang-Gon Kim, Joon-Seuk Lee, Eung-Ryong Oh, Hong-Bok Yeon, Young-Deuk Kim, Seung-Uk Jeong, Sang-Ho Lee, and Chan-Ha Park "Qualification of small alignment mark by on-product overlay performance", Proc. SPIE 11613, Optical Microlithography XXXIV, 116130J (22 February 2021); https://doi.org/10.1117/12.2584618

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available