Paper
4 December 2020 Research on a potential electron source for BEPC
Author Affiliations +
Proceedings Volume 11617, International Conference on Optoelectronic and Microelectronic Technology and Application; 116170S (2020) https://doi.org/10.1117/12.2584876
Event: International Conference on Optoelectronic and Microelectronic Technology and Application, 2020, Nanjing, China
Abstract
Electron bunch play an important role in science and industry applications. We put forward of a novel idea to generate electron beam and compress them short enough for further acceleration in this paper. Several hundred KeV electron beam can be generated by the interaction between relativistic laser and metal wire target. RF field in the cavity can be used to compress the bunch length of the electron beam by choosing RF phase for further acceleration in BEPC main accelerator. In simulation with ASTRA code, we inject 100keV~200keV, 41ps, 1nc electron beam into RF cavity, to compress the electron bunch length into ~10ps, and to increase the electron energy to 415keV, which is satisfied the requirement of BEPC on the electron source.
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Jiapeng Yin and Shengguang Liu "Research on a potential electron source for BEPC", Proc. SPIE 11617, International Conference on Optoelectronic and Microelectronic Technology and Application, 116170S (4 December 2020); https://doi.org/10.1117/12.2584876
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