25 January 1990 Excimer Laser Reflectors
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Abstract
The development of low losses all - dielectric laser reflector is essential for powerful excimer lasers in UV and VUV. The excimer laser reflectors at wavelengths of 351nm( Xen , 308nm( XeC1) and 193nm ( ArF) consisted of Zr02 - Y203/Si02 and A1203/Si02 have been prepared. The reflectance in such reflectors reaches 99. 7% at wavelength of 351nm, 99. 5% at 308nm, and 98% at 193nm. And the laser in-duced damage threshold has been raised to around 8. 5J/cm2 at wavelength of 308nm.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peifu Gu, Jinfa Tang, "Excimer Laser Reflectors", Proc. SPIE 1166, Polarization Considerations for Optical Systems II, (25 January 1990); doi: 10.1117/12.962924; https://doi.org/10.1117/12.962924
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