9 November 1989 An Instrument For Generation And Control Of Sub-Micron Motion.
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Abstract
This paper describes a new class of instruments that can reliably produce and control small motions. The instrument is intrinsically stiff, stable, athermal and adaptable to very harsh environments. Although the principles may be scaled for large motions, their current application is optimized for the optical wavelength range, a micron to an angstrom or smaller. The paper also describes the "calibrated elasticity" principles used in the development of the instruments.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alson E. Hatheway, Alson E. Hatheway, } "An Instrument For Generation And Control Of Sub-Micron Motion.", Proc. SPIE 1167, Precision Engineering and Optomechanics, (9 November 1989); doi: 10.1117/12.962961; https://doi.org/10.1117/12.962961
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