Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics

H. Guckel

doi:10.1117/12.962936

9 November 1989 Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics

H. Guckel

Proceedings Volume 1167, Precision Engineering and Optomechanics; (1989) https://doi.org/10.1117/12.962936
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

X-ray masks are micromechanical structures. They are best fabricated from thin films of low atomic number materials with built-in tensile strain. Optimized low pressure chemical vapor deposited polysilicon films have the desired characteristics for excellent x-ray masks. They also offer many other application opportunities as stencil masks and optical filters. Deep x-ray lithography has been developed in Germany. Concepts in very thick photoresist processing are fundamentally involved in this procedure. The end result: nearly three-dimensional metal structures will be very beneficial to future micro-structure fabrication.

Citation Download Citation

H. Guckel "Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics", Proc. SPIE 1167, Precision Engineering and Optomechanics, (9 November 1989); https://doi.org/10.1117/12.962936

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