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5 March 2021 Dual wavelength double fs-pulse laser irradiation for fused silica processing
John Lopez, Kevin Gaudfrin, Konstantin Mishchik, Martin Delaigue, Clemens Hoenninger, Eric Audouard, Laura Gemini, Rainer Kling, Guillaume Duchateau
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Proceedings Volume 11674, Laser-based Micro- and Nanoprocessing XV; 1167409 (2021) https://doi.org/10.1117/12.2578632
Event: SPIE LASE, 2021, Online Only
Abstract
In the present work, we investigate the benefits and the drawbacks in using on dual-wavelength double fs-pulse laser irradiation for fused silica processing. Our purpose of this pump-pump experiment is to tune the electron dynamics in order to optimize energy deposition and then to improve ablated volume. We use green wavelength (515 nm) for the first pulse to enhance photo-ionization and near-infrared (1030 nm) for the second pulse to maximize electron heating and impact ionization. The investigated parameters are pulse-to-pulse delay (up to 20 ps), second pulse duration (1 and 10 ps) and total fluence (up to 20 J/cm²). The results will be discussed in terms of ablated volume and optical transmission. We demonstrate that (i) there is an optimum delay and (ii) the ablation behavior is intermediate between green and near-infrared single pulse irradiation. Our results are supported by a numerical model taking into account electron dynamics and absorbed energy density.
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John Lopez, Kevin Gaudfrin, Konstantin Mishchik, Martin Delaigue, Clemens Hoenninger, Eric Audouard, Laura Gemini, Rainer Kling, and Guillaume Duchateau "Dual wavelength double fs-pulse laser irradiation for fused silica processing", Proc. SPIE 11674, Laser-based Micro- and Nanoprocessing XV, 1167409 (5 March 2021); https://doi.org/10.1117/12.2578632
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KEYWORDS
Laser irradiation
Silica
Ultrafast lasers
Laser applications
Picosecond phenomena
Ionization
Laser processing
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