Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

Rio Suzuki; Reiji Koike; Keita Katayama; Mitsuhiro Higashihata; Hiroshi Ikenoue; Daisuke Nakamura

doi:10.1117/12.2576843

20 April 2021 Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

Rio Suzuki, Reiji Koike, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, Daisuke Nakamura

Proceedings Volume 11674, Laser-based Micro- and Nanoprocessing XV; 116741G (2021) https://doi.org/10.1117/12.2576843
Event: SPIE LASE, 2021, Online Only

Conference Poster

Abstract

SiO₂ nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO₂ nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO₂ nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

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Citation Download Citation

Rio Suzuki, Reiji Koike, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, and Daisuke Nakamura "Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase", Proc. SPIE 11674, Laser-based Micro- and Nanoprocessing XV, 116741G (20 April 2021); https://doi.org/10.1117/12.2576843

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