Manufacture Of Optical Interference Coatings By Low Pressure Chemical Vapor Deposition

Donald Z. Rogers

doi:10.1117/12.962966

22 December 1989 Manufacture Of Optical Interference Coatings By Low Pressure Chemical Vapor Deposition

Donald Z. Rogers

Proceedings Volume 1168, Current Developments in Optical Engineering and Commercial Optics; (1989) https://doi.org/10.1117/12.962966
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Low Pressure Chemical Vapor Deposition (LPCVD) has found wide use as a manufacturing process in semiconductor fabrication, but has not been previously used successfully for the manufacture of optical coatings. Recent work at Deposition Sciences has made it possible to manufacture on a routine basis optical interference coatings using LPCVD. LPCVD has replaced evaporation as the preferred method for deposition of the optical coating on domes for Stinger missiles; over 10,000 Stinger missile domes have been coated by Deposition Sciences using our LPCVD manufacturing process. LPCVD processes have inherent technical and cost advantages over evaporation for a wide variety of optical coating applications. LPCVD is the process of choice for optical coating of very non-planar substrates, or for optical coatings that must withstand rigorous environments. This paper describes the properties of the LPCVD process as applied to optical coatings, some performance advantages of optical films deposited by LPCVD, and the capabilities of Deposition Sciences' current LPCVD manufacturing system.

Citation Download Citation

Donald Z. Rogers "Manufacture Of Optical Interference Coatings By Low Pressure Chemical Vapor Deposition", Proc. SPIE 1168, Current Developments in Optical Engineering and Commercial Optics, (22 December 1989); https://doi.org/10.1117/12.962966

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