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5 January 1990 Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer
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Abstract
A new on-wafer bidirectional nondestructive measurement method is demonstrated for measuring losses in three dimensional integrated optical waveguides. A thermally oxidized silicon wafer is used as substrate for silicon nitride multimode waveguides. The measurement is based on p-i-n photodetectors integrated near the waveguide. In order to eliminate the effect of different sensitivities of adjacent p-i-n detectors, the light is launched separately to both ends of the waveguide. The method can be applied to test structures in optoelectronic integrated circuits (OEIC's).
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jaakko Aarnio and Matti Leppihalme "Bidirectional Method For Optical Channel Waveguide Attenuation Measurement By Detectors Integrated On The Wafer", Proc. SPIE 1177, Integrated Optics and Optoelectronics, (5 January 1990); https://doi.org/10.1117/12.963331
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