CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 11775 > Article
Presentation
18 April 2021 Efficient dual-band grating coupler for 10 Gbit passive optical networks fabricated by 193-nm deep-ultraviolet lithography
David González-Andrade, Diego Pérez-Galacho, Miguel Montesinos-Ballester, Xavier Le Roux, Eric Cassan, Delphine Marris-Morini, Pavel Cheben, Nathalie Vulliet, Stephane Monfray, Frédéric Boeuf, Laurent Vivien, Aitor Villafranca Velasco, Carlos A. Alonso-Ramos
Author Affiliations +
Proceedings Volume 11775, Integrated Optics: Design, Devices, Systems and Applications VI; 117750H (2021) https://doi.org/10.1117/12.2589704
Event: SPIE Optics + Optoelectronics, 2021, Online Only
Abstract
The large mode size mismatch between standard single-mode optical fibers and silicon-on-insulator (SOI) waveguides poses a significant challenge to efficiently couple light from the optical fiber to the chip, and vice versa. Surface grating couplers are often used for this purpose, however, their operational bandwidth is limited to a few tens of nanometers, as a consequence of the wavelength-dependent radiation angle. This constraint seriously hampers the use of surface grating couplers for next-generation passive optical networks (PONs), in which the wavelengths used for the upstream and downstream channels are separated more than 150 nm. In this work, we present a dual-band grating coupler for 10 Gbit symmetric PONs. Our device operates as a wavelength multiplexer/demultiplexer, simultaneously coupling and combining/splitting two optical signals at the wavelengths of λ_1=1270 nm and λ_2=1577 nm. The coupler is based on engineering a surface grating coupler to obtain opposite radiation angles for the two respective wavelengths. To achieve a higher coupling efficiency, the material platform thicknesses were optimized as a tradeoff between the waveguide propagation loss and the substrate reflectivity. By judiciously choosing the period (Λ=500 nm) and the duty cycle (DC=55%) of the grating section, an efficient dual-band grating coupler is designed with a minimum feature size of 225 nm. The coupler was fabricated in ST Crolles using their 300 mm SOI platform and 193-nm deep-ultraviolet lithography, demonstrating that large-scale fabrication is feasible. Measured fiber-chip coupling efficiencies were -4.9 dB and -5.2 dB with a 3-dB bandwidth of >27 nm and 56 nm at λ_1=1270 nm and λ_2=1577 nm, respectively.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
David González-Andrade, Diego Pérez-Galacho, Miguel Montesinos-Ballester, Xavier Le Roux, Eric Cassan, Delphine Marris-Morini, Pavel Cheben, Nathalie Vulliet, Stephane Monfray, Frédéric Boeuf, Laurent Vivien, Aitor Villafranca Velasco, and Carlos A. Alonso-Ramos "Efficient dual-band grating coupler for 10 Gbit passive optical networks fabricated by 193-nm deep-ultraviolet lithography", Proc. SPIE 11775, Integrated Optics: Design, Devices, Systems and Applications VI, 117750H (18 April 2021); https://doi.org/10.1117/12.2589704
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Deep ultraviolet
Lithography
Passive optical networks
Silicon
Waveguides
Oxides
Photonic devices
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top