Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon

Jingyi Li; Wei Zhang; Yu Zhou; Xiaoyun Zhang; Chenxiao Zhao; Guangyong Jin

doi:10.1117/12.2589823

18 March 2021 Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon

Jingyi Li, Wei Zhang, Yu Zhou, Xiaoyun Zhang, Chenxiao Zhao, Guangyong Jin

Author Affiliations +

Proceedings Volume 11780, Global Intelligent Industry Conference 2020; 117800R (2021) https://doi.org/10.1117/12.2589823
Event: Global Intelligent Industry Conference 2020, 2020, Guangzhou, China

Abstract

In this paper, the temperature and damage morphology of silicon induced by ms-ns combined-pulse laser with different pulse delay are investigated. The small holes and trapped bubbles were formed on the center of damage morphology when the pulse delay is 0.8ms -1ms. The temperature of target exceeds the melting point and the molten pool begins to be formed before the irradiation of ns laser. It was found that the process of droplet ejection and phase explosion might occurred after the irradiation of ns laser. The relationship between temperature and damage morphology induced by ms–ns combined-pulse laser with different pulse delays was discussed. The results in this paper can provide foundation for ms-ns combined-pulse laser processing of semiconductor materials in the future.

Citation Download Citation

Jingyi Li, Wei Zhang, Yu Zhou, Xiaoyun Zhang, Chenxiao Zhao, and Guangyong Jin "Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon", Proc. SPIE 11780, Global Intelligent Industry Conference 2020, 117800R (18 March 2021); https://doi.org/10.1117/12.2589823

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