Translator Disclaimer
Paper
28 February 2021 A comparative study of dry-etching nanophotonic devices on a LiNbO3-on-insulator material platform
Author Affiliations +
Proceedings Volume 11781, 4th Optics Young Scientist Summit (OYSS 2020); 117810X (2021) https://doi.org/10.1117/12.2590415
Event: Optics Frontier: Optics Young Scientist Summit, 2020, Ningbo, China
Abstract
Three different novel dry-etching methods have been employed to fabricate nanophotonic devices upon a thin-film lithium niobate on insulator material platform. Different dry-etching processes and their advantages, drawbacks and applicable scenarios are systematically studied. Ultra-smooth etching surface with roughness of 0.46 nm (Rq), low-loss ridge waveguides with extracted propagation loss of 1.42 dB/cm, and microring resonators with high optical quality factors up to 1.4×105 are demonstrated using the optimized low-loss etching recipe. The low-loss etching technique lays a foundation for monolithic integration of passive optical components with quantum dots, on-chip broadband electro- optic modulators and wafer-scale lithium niobate integrated photonic circuits.
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chen Shen, Chengli Wang, Yifan Zhu, Jinbo Wu, Yang Chen, Zhongxu Li, Kai Huang, Xiaomeng Zhao, Sannian Song, Jiaxiang Zhang, and Xin Ou "A comparative study of dry-etching nanophotonic devices on a LiNbO3-on-insulator material platform", Proc. SPIE 11781, 4th Optics Young Scientist Summit (OYSS 2020), 117810X (28 February 2021); https://doi.org/10.1117/12.2590415
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top