Presentation
20 June 2021 Characterization of the optical aberrations of a metrological UV microscope
Author Affiliations +
Abstract
In light microscopy, optical aberrations always affect the performance of the employed microscope. They can emerge from imperfect optical components of the microscope, like lenses, or from misalignments of such optical components, which may even change over time. In our contribution, we retrieve the optical aberrations in form of Zernike polynomials from measurements of small point structures by applying the extended Nijboer-Zernike approach. Subsequently, we include the expression for these optical aberrations in rigorous simulations of the microscope’s imaging process. Finally, we will compare the simulations with measurements to demonstrate optical bidirectional measurements on aberrant imaging systems.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Krüger, Bernd Bodermann, Rainer Köning, Wolfgang Haessler-Grohne, and Han Xu "Characterization of the optical aberrations of a metrological UV microscope", Proc. SPIE 11783, Modeling Aspects in Optical Metrology VIII, 117830F (20 June 2021); https://doi.org/10.1117/12.2592566
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KEYWORDS
Optical aberrations

Microscopes

Metrology

Ultraviolet radiation

Image processing

Imaging systems

Optical components

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