CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 11783 > Article
Presentation
20 June 2021 Optical constants for EUV scatterometry
Richard Ciesielski, Qais Saadeeh, Philipp Naujok, Karl Opsomer, Jean-Philippe Soulié, Meiyi Wu, Vicky Philipsen, Robbert W.. E. van de Kruijs, Michael Kolbe, Frank Scholze, Victor Soltwisch
Author Affiliations +
Proceedings Volume 11783, Modeling Aspects in Optical Metrology VIII; 117830M (2021) https://doi.org/10.1117/12.2592543
Event: SPIE Optical Metrology, 2021, Online Only
Abstract
Development of efficient absorber masks and highly reflective mirrors in the EUV spectral range is a key challenge for upcoming lithography techniques in semiconductor technology. There is an improved need to precisely know the optical constants of the materials at hand for specialized applications such as phase shifting absorber masks. A further field of application is the interpretation and accompanied modeling of scattering data of complex nanostructures. At PTB, we measured the spectral reflectance of thin film samples in the angular range from normal incidence to grazing incidence in the range of 10nm to 20nm using PTB’s lubrication-free Ellipso-Scatterometer at the soft x-ray beamline at the electron storage ring BESSY II. This allowed us to determine the optical constants of a variety of metals, semimetals and their alloys from model fits based on Fresnel’s equations for layered material stacks.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Richard Ciesielski, Qais Saadeeh, Philipp Naujok, Karl Opsomer, Jean-Philippe Soulié, Meiyi Wu, Vicky Philipsen, Robbert W.. E. van de Kruijs, Michael Kolbe, Frank Scholze, and Victor Soltwisch "Optical constants for EUV scatterometry", Proc. SPIE 11783, Modeling Aspects in Optical Metrology VIII, 117830M (20 June 2021); https://doi.org/10.1117/12.2592543
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Data modeling
Photomasks
Reflectivity
Nanostructures
Phase shifting
Scattering
Semiconductors
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top