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1 August 2021 X-scan: characterizing optical nonlinearity in a single nanostructure
Shi-Wei Chu
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Proceedings Volume 11797, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIX; 117970T (2021) https://doi.org/10.1117/12.2594288
Event: SPIE Nanoscience + Engineering, 2021, San Diego, California, United States
Abstract
Nonlinear optical effects are key toward communication, sensing, imaging, etc. Recently, we found nonlinear scattering/absorption in plasmonic and silicon nanostructures based on photothermal interactions, featuring high-contrast all-optical switching and non-bleaching super-resolution microscopy. The conventional method of quantifying optical nonlinearity is z-scan, which typically works with thin films, and thus acquires ensemble nonlinear responses, not from single nanostructure. Here we advocate an x-scan technique that is based on a confocal laser scanning microscope with both forward and backward detections, offering simultaneous quantification for nonlinear behavior of scattering, absorption and total attenuation from a single nanostructure.
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Shi-Wei Chu "X-scan: characterizing optical nonlinearity in a single nanostructure", Proc. SPIE 11797, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIX, 117970T (1 August 2021); https://doi.org/10.1117/12.2594288
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KEYWORDS
Nanostructures
Nonlinear optics
Plasmonics
Scattering
Signal attenuation
Silicon
Silicon films
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