Presentation + Paper
1 August 2021 Direct patterning of TiO2 and TiN based sol-gel using laser interference and nanospheres UV lithography
Y. Jourlin, N. Crespo-Monteiro, A. Valour
Author Affiliations +
Abstract
In this paper, a direct and cost-effective sol-gel method enables to produce stable titanium dioxide and titanium oxynitride photoresists is described. This approach is compatible with many photolithographic techniques. We show that laser interference lithography and nanosphere lithography can be used, respectively, to obtain homogeneous TiO2 diffraction gratings and periodic nanopillars over large areas. Further developments permit to transform TiO2 microstructured based sol-gel to TiN metallic microstructured layer, with good optical properties, by using an innovative rapid thermal nitridation process, which opens the way towards plasmonics and NIR filters based on periodic metallic microstructured layers.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. Jourlin, N. Crespo-Monteiro, and A. Valour "Direct patterning of TiO2 and TiN based sol-gel using laser interference and nanospheres UV lithography", Proc. SPIE 11801, UV and Higher Energy Photonics: From Materials to Applications 2021, 1180104 (1 August 2021); https://doi.org/10.1117/12.2596229
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KEYWORDS
Tin

Thin films

Titanium dioxide

Lithography

Silica

Sol-gels

Near infrared

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