Model validation of phase-induced amplitude apodization complex mask coronagraph for LUVOIR-A in vacuum

Dan Sirbu; David Marx; Ruslan Belikov; Eduardo Bendek; Kevin W. Fogarty; Brian Kern; Olivier Guyon; Eugene E. Pluzhnyk; Daniel W. Wilson

doi:10.1117/12.2594901

1 September 2021 Model validation of phase-induced amplitude apodization complex mask coronagraph for LUVOIR-A in vacuum

Dan Sirbu, David Marx, Ruslan Belikov, Eduardo Bendek, Kevin W. Fogarty, Brian Kern, Olivier Guyon, Eugene E. Pluzhnyk, Daniel W. Wilson

Author Affiliations +

Proceedings Volume 11823, Techniques and Instrumentation for Detection of Exoplanets X; 118230R (2021) https://doi.org/10.1117/12.2594901
Event: SPIE Optical Engineering + Applications, 2021, San Diego, California, United States

Abstract

The Phase-Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is a coronagraph architecture for the next generation of large space telescopes optimized for habitable exoplanet imaging that can achieve attractive theoretical performance with high throughput at small inner working angles (IWA). PIAACMC designs are compatible with large, on-axis, segmented apertures such as the Large UV / Optical/ Infrared A (LUVOIRA) concept currently being considered by the decadal survey review which would greatly enhance the possibility to achieve statistically significant scientific yields and signal quality for direct imaging exoplanet surveys. A PIAACMC design has been recently created for LUVOIR-A and is currently being tested in vacuum at JPL’s High-Contrast Imaging Testbed (HCIT). In this work, we review the theoretical performance of the PIAACMC instrument designed to meet a 1e-9 raw contrast goal in 10% broadband light in a region from 2-8 λ/D both before and after the wavefront control loop. We use empirical measurements from the vacuum testbed to verify the instrument model and its performance including line-of-sight errors, instrument alignment, and fabricated components. In particular, the model verification includes measured sags of the manufactured PIAA mirrors by NuTek. The CMC mask was manufactured at JPL’s Microdevices Laboratory and we include surface profile characterization measurement. We assess the impact on performance of the different manufacturing and alignment errors.

Conference Presentation

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Dan Sirbu, David Marx, Ruslan Belikov, Eduardo Bendek, Kevin W. Fogarty, Brian Kern, Olivier Guyon, Eugene E. Pluzhnyk, and Daniel W. Wilson "Model validation of phase-induced amplitude apodization complex mask coronagraph for LUVOIR-A in vacuum", Proc. SPIE 11823, Techniques and Instrumentation for Detection of Exoplanets X, 118230R (1 September 2021); https://doi.org/10.1117/12.2594901

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