Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications

Kushlendra Mishra; Rachit Sharma; Ingo Bork; Peter Buck; Dongeun Cha; Seungheon Na; Jaekwang Kim; Kiwook Park; Inpyo Kim

doi:10.1117/12.2600926

12 October 2021 Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications

Kushlendra Mishra, Rachit Sharma, Ingo Bork, Peter Buck, Dongeun Cha, Seungheon Na, Jaekwang Kim, Kiwook Park, Inpyo Kim

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Proceedings Volume 11855, Photomask Technology 2021; 118550Z (2021) https://doi.org/10.1117/12.2600926
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

Model-based Mask Process Correction (MPC) is an indispensable data processing step for producing masks for advanced wafer production nodes. Typically, calibration of an MPC model may require several thousands SEM measurements. However, due to metrology tool-time constraints, there is an increasing requirement to minimize the number of measurements for building an MPC model, without impacting the model quality significantly. This work presents the development of a down-sampling approach using a combination of sensitivity analysis and clustering to reduce a larger set of diverse measurement locations to a smaller subset according to the metrology budget of photomask engineers.

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Kushlendra Mishra, Rachit Sharma, Ingo Bork, Peter Buck, Dongeun Cha, Seungheon Na, Jaekwang Kim, Kiwook Park, and Inpyo Kim "Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications", Proc. SPIE 11855, Photomask Technology 2021, 118550Z (12 October 2021); https://doi.org/10.1117/12.2600926

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