19 March 1990 Bridge Type Josephson Junction in YBaCuO Thin Films by MOCVD
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Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990); doi: 10.1117/12.965172
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
Micro-bridges are fabricated with YBa2Cu3O7-8 thin films prepared by CVD method. The thickness of the bridge is ranging from 0.2 to 1 µm and the width and length are both about 1 µm. The critical current density of the bridge is ranging from 104 to 105 A/cm2 at 77K in zero field. The bridge shows clear ac and dc Josephson effects. However, temperature dependences of critical current show Ic oc (1-T/Tc)3/2, which suggests the transport current is superconducting bulk current and not Josephson current. The single bridge looks like a typical Josephson junction and all transport current in the bridge behaves as Josephson current.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsutomu Yamashita, Toshio Hirai, Hideyuki Kurosawa, Toshiaki Matsui, "Bridge Type Josephson Junction in YBaCuO Thin Films by MOCVD", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); doi: 10.1117/12.965172; https://doi.org/10.1117/12.965172
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KEYWORDS
Bridges

Superconductors

Chemical vapor deposition

Thin films

Technetium

Electronics

Photography

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