19 March 1990 Focused Ion Beam Modification And Patterning Of High TC Superconductors
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Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990) https://doi.org/10.1117/12.965165
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
High-resolution patterning of thin-film high temperature superconductors is necessary in the development of device applications of these new materials. Such fine-line structures are necessary in the fabrication of devices such as superconducting quantum interference devices (SQUIDS), transmission lines and others. Furthermore, high spatial resolution patterning can be an important tool in studying the fundamental properties of the films themselves. Focused ion beam patterning has recently been applied to YBaCuO thin films. The finely focused ion beam can produce patterns by local physical sputtering or through implant damage. These techniques have proven to be valuable for producing submicron superconducting structures in a reliable way.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. R. Harriott, L. R. Harriott, "Focused Ion Beam Modification And Patterning Of High TC Superconductors", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); doi: 10.1117/12.965165; https://doi.org/10.1117/12.965165
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