19 March 1990 Pulsed Laser Deposition of HTSC Thallium Films
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Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990) https://doi.org/10.1117/12.965150
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Pulsed laser deposition is a technique commonly used to deposit high quality thin films of high temperature superconductors. We discuss the results obtained when this technique is applied to the deposition of Tl-CA-Ba-Cu-O thin films using a frequency doubled Nd:YAG laser operating at 532 nm and an excimer laser operating at 248 nm. Films with onset temperatures of 125 K and zero resistance temperatures of 110 K deposited on (100) oriented MgO from a composite T12Ca2Ba2Cu3Ox target were obtained at both wavelengths upon appropriate post deposition annealing. We will discuss the microstructure and composition as a function of laser wavelength and annealing conditions.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. J. Ianno, N. J. Ianno, J. A. Woollam, J. A. Woollam, S. H. Liou, S. H. Liou, D. Thompson, D. Thompson, B. Johs, B. Johs, } "Pulsed Laser Deposition of HTSC Thallium Films", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); doi: 10.1117/12.965150; https://doi.org/10.1117/12.965150


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