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In this work we present a new all-silica coating - polarizer, which is also capable to withstand high density of radiation. In order to demonstrate the versatility of presented approach, several coating designs have been modelled and two of them fabricated together with the full-scale measurements and analysis necessary for polarizers implementation into high power microlaser systems. Two polarizing coatings at the wavelength of 355 nm have been formed using two stepper motors based GLAD system. Afterwards optical and structural analysis have been performed including spectrophotometric, atomic-force microscopy (AFM), scanning electron microscopy (SEM) and optical resistivity measurements.
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L. Grineviciute, L. Ramalis, R. Buzelis, T. Tolenis, "Highly resistant all-silica polarizers for normal incidence applications," Proc. SPIE 11872, Advances in Optical Thin Films VII, 118720X (12 September 2021); https://doi.org/10.1117/12.2597136