15 February 1990 Multichamber And In-Situ Processing System Design And Control
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Proceedings Volume 1188, Multichamber and In-Situ Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963934
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
For multichamber and in-situ processing of microelectronic materials, there are few hundred steps in a manufacturing line. The design of such processing systems require careful simulation, modeling, and planning. Our basic approach is the idea of an interactive software design environment for equipment, process, and manufacturing line modeling and simulation, which provides a way to integrate the manufacturing line and its simulator tightly.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Su-shing Chen, Su-shing Chen, "Multichamber And In-Situ Processing System Design And Control", Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); doi: 10.1117/12.963934; https://doi.org/10.1117/12.963934
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